Development of Al2O3, ZrO2 and Al2O3/ ZrO2 thin film coating on mild steel using RF sputtering to improve corrosion protection for small scale industrial applications.
Author
G. ABHISHEK, Dr. KALAPALA PRASAD, THANETI LILLY RANI, P. SRINIVASA SUBBA RAO
Abstract
Mild steel is commonly used in engineering and manufacturing industries because it is inexpensive, easily available, and has good mechanical properties. However, it is highly susceptible to corrosion, particularly in industrial environments. Applying protective thin-film coatings to the steel surface is an effective method to improve its corrosion resistance. In this study, Al₂O₃, ZrO₂, and Al₂O₃–ZrO₂ (AZO) composite coatings were deposited on mild steel using radio-frequency (RF) sputtering. The coatings were deposited at a pressure of 2 × 10⁻² mbar with an RF power of 70 W. X-ray Photoelectron Spectroscopy (XPS) confirmed the presence of aluminium and zirconium in the deposited coatings. X-ray Diffraction (XRD) and Raman spectroscopy were used to study the structural and bonding characteristics of the coatings. Raman analysis showed peaks in the 300–530 cm⁻¹ range for Al₂O₃ and AZO, with a major peak around 670 cm⁻¹ observed for the studied coatings. Field Emission Scanning Electron Microscopy (FESEM) showed a dense coating with a thickness of approximately 200 ± 20 nm. Atomic Force Microscopy (AFM) measured peak heights of 226 nm, 300 nm, and 104 nm for Al₂O₃, ZrO₂, and AZO coatings, respectively. The corrosion performance was investigated using Open Circuit Potential (OCP), Electrochemical Impedance Spectroscopy (EIS), and Potentiodynamic Polarization techniques. The results showed that the AZO composite coating provided better corrosion protection than the individual Al₂O₃ and ZrO₂ coatings. The improved corrosion resistance is associated with the dense protective coating, which reduces the contact between the mild steel surface and the corrosive environment.
Keywords
Al2O3; ZrO2; Al2O3/ ZrO2 composite; Mild steel; RF Sputtering; Thin film coating; Corrosion resistance; Electrochemical corrosion.
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References
1.Singh, P., Jha, R. K., Singh, R. K., & Singh, B. R. (2018). Preparation and characterization of Al2O3 film deposited by RF sputtering and plasma enhanced atomic layer deposition. Journal of Vacuum Science & Technology B, 36(4).
2.Korsunska, N., Khomenkova, L., Kolomys, O., Strelchuk, V., Kuchuk, A., Kladko, V., ... & Balberg, I. (2013). Si-rich Al2O3 films grown by RF magnetron sputtering: structural and photoluminescence properties versus annealing treatment. Nanoscale Research Letters, 8(1), 273.
3.Paven-Thivet, L., Malibert, C., Houdy, P., & Albouy, P. A. (1998). RF-sputtering deposition of Al/Al2O3 multilayers. Thin solid films, 336(1-2), 373-376.
4.García-Valenzuela, J. A., Rivera, R., Morales-Vilches, A. B., Gerling, L. G., Caballero, A., Asensi, J. M., ... & Andreu, J. (2016). Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers. Thin Solid Films, 619, 288-296.
5.Angarita, G., Palacio, C., Trujillo, M., & Arroyave, M. (2017, June). Synthesis of alumina thin films using reactive magnetron sputtering method. In Journal of Physics: Conference Series (Vol. 850, No. 1, p. 012022). IOP Publishing.
6.Blazquez, R. R., Solis-Pomar, F., Fundora, A., Ruiz-Roblez, M. A., Fragiel, A., & Perez-Tijerina, E. (2025). Influence of Radio Frequency Magnetron Sputtering Parameters on the Structure and Performance of Al and Al2O3 Thin Films. East European Journal of Physics, (3), 505-511.
7.Panitchakan, H., & Limsuwan, P. (2012). Characterization of aluminum oxide films deposited on Al2O3-TiC by RF diode sputtering. Procedia Engineering, 32, 902-908.
8.Khojier, K., Savaloni, H., & Jafari, F. (2013). Structural, electrical, and decorative properties of sputtered zirconium thin films during post-annealing process. Journal of Theoretical and Applied Physics, 7(1), 55.
9.Gao, P., Meng, L. J., Dos Santos, M. P., Teixeira, V., & Andritschky, M. (2000). Characterisation of ZrO2 films prepared by rf reactive sputtering at different O2 concentrations in the sputtering
gases. Vacuum, 56(2), 143-148.
10.Rawal, S. K., Chawla, A. K., Chawla, V., Jayaganthan, R., & Chandra, R. (2011). Characterization of bi-phased Zr2ON2–ZrO2 coatings deposited by RF magnetron sputtering. Thin solid films, 520(5), 1589-1596.
11.Mohammed, Z., Khalil, S., & Mutter, M. (2019). Synthesis and characterization of ZrO2: MgO thin films by plasma of RF magnetron sputtering. Karbala International Journal of Modern Science, 5(1), 3.
12.Gao, P., Meng, L. J., Dos Santos, M. P., Teixeira, V., & Andritschky, M. (2000). Study of ZrO2–Y2O3 films prepared by rf magnetron reactive sputtering. Thin solid films, 377, 32-36.
13.Zegtouf, H., Saoula, N., Azibi, M., Bait, L., Madaoui, N., Khelladi, M. R., & Kechouane, M. (2019). A study of properties of ZrO2 thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application. Journal of Electrical Engineering, 70(7), 117-121.
14.Bakacak, P. K., Gur, E., Bayram, O., Tuzemen, S., & Simsek, O. (2021). Photoluminescence and structural properties of zirconium dioxide thin films produced by RF sputtering technique. Journal of Materials Science: Materials in Electronics, 32(6), 7541-7549.
15.Trinh, D. H., Högberg, H., Andersson, J. M., Collin, M., Reineck, I., Helmersson, U., & Hultman, L. (2006). Radio frequency dual magnetron sputtering deposition and characterization of nanocomposite Al2O3–ZrO2 thin films. Journal of Vacuum Science & Technology A, 24(2), 309-316.
16.Liu, H., Gao, M., Chen, H., Zhang, Y., Chen, J., Liu, Z., ... & Zhang, H. (2025). Study on Al2O3 and ZrO2 doped LiNbO3 ceramics and the sputtered thin films. Journal of the European Ceramic Society, 45(5), 117139.
17.jafar Moradi, M., Moradi, G., Heydarinasab, A., & Rashidi, A. (2023). Preparation and optimization of Ni-Co/Al2O3-ZrO2 films as catalytic coating on microchannels reactor for methane dry
reforming. Materials Today Communications, 34, 105226.
18.Trinh, D. H., Ottosson, M., Collin, M., Reineck, I., Hultman, L., & Högberg, H. (2008). Nanocomposite Al2O3–ZrO2 thin films grown by reactive dual radio-frequency magnetron sputtering. Thin Solid Films, 516(15), 4977-4982.
19.Teixeira, V., Monteiro, A., Duarte, J., & Portinha, A. (2002). Deposition of composite and nanolaminate ceramic coatings by sputtering. Vacuum, 67(3-4), 477-483.
20.Ning, S., Zhan, P., Xie, Q., Li, Z., & Zhang, Z. (2013). Room-temperature ferromagnetism in un-doped ZrO2 thin films. Journal of Physics D: Applied Physics, 46(44), 445004.
21.Pati, J., Priyadarshinee, S., Mohanty, P., Mahapatra, R., Mohanta, K. L., Mishra, D. K., & Mohapatra,
J. (2022). Studies of structural, micro structural, optical and electrical properties of alumina toughened zirconia. Results in Chemistry, 4, 100458.
22.Ohtsu, Y., Egami, M., Fujita, H., & Yukimura, K. (2005). Preparation of zirconium oxide thin film using inductively coupled oxygen plasma sputtering. Surface and Coatings Technology, 196(1-3), 81-84.
23.Balangao, J. K. (2024). Corrosion of metals: factors, types and prevention strategies. Journal of Chemical Health Risks, 14(1), 79-87.
24.Piras, C. C., Fernández-Prieto, S., & De Borggraeve, W. M. (2019). Ball milling: a green technology for the preparation and functionalisation of nanocellulose derivatives. Nanoscale Advances, 1(3), 937-947.
25.Raven, M. S. (1994). Radio frequency sputtering and the deposition of high-temperature superconductors. Journal of Materials Science: Materials in Electronics, 5(3), 129-146.
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